Tickets are on sale now for the Morgan's 3rd Annual Dress to IMPRESS Paper Fashion Fundraiser on Saturday, October 3rd from 6-10 p.m.
This year, we welcome you to, BRAVE NEW WORLD(S) ~ a hyper-stylish and fashion-forward era that embraces multiple and new realities. The world of fashion has consistently served as a mirror to society, reflecting current moods, social movements, and cultural paradigms. In Brave New Worlds, dystopian fashions will express concerns for the future and societal turbulence with a “new possible” stepping forth.
More than 15 artist-designers are addressing this bold theme, creating ensembles incorporating a combination of traditional and innovative materials with paper and printed matter as major “ingredients”. Brave New Worlds, the runway show and exhibition, will present a profound statement about our current society and the potential paths we might take. It invites us to contemplate the world we live in presently and the new world we wish to enter.
Doors open at 6 p.m., the fashion walk begins at 7 p.m., with prizes for first place, runner up, and best-dressed attendee. We will have a cash bar, delightful finger foods, silent & online auctions, DJ NicNacc, a red carpet runway show, and more! There is ample parking at the rear of our building, off of East 45th Street. Last year's event was a smash success ~ we can't wait to see you there!
Tickets are on sale now! Click here for details.
In conjunction with Dress to IMPRESS, the Morgan Conservatory is seeking artwork that explores dystopian themes and possible futures through paper- and print-focused media. Artworks should be primarily two-dimensional / for wall display. Artists may submit up to three entries. The exhibition will be on view from September 23rd to October 24th, 2026.
Submissions Deadline: Saturday, August 22nd at 11:59 p.m. EST
Notification of Acceptance: Saturday, August 29th
Genius Loci, the Pathos of Places
Curated by Arron Levi Foster & Erik Waterkotte
On View through August 28
Originally exhibited at the 2024 Mid-American Print Council’s Biannual Print Conference, and reprised for exhibition at the Morgan Conservatory, Genius Loci, the Pathos of Places features 15 contemporary artists whose works explore the interstitial impact of particular places using print, hand papermaking, photography, installation, and mixed media. Curated by Arron Foster and Erik Waterkotte, the artists’ projects each document, express, and expose unique geographic places. Genius Loci, “the spirit of the place”, refers to a location’s distinctive atmosphere or a location’s protective spirit and how humans assign meaning and respond emotionally to places; both individually and in our collective existence.
Read the wonderful write up by Carlo Wolff in Canvas magazine here.
Much fun celebrating the Morgan's Graduating Professional Papermakers & Cookout on Saturday, July 25th!
Nicole Donnelly moderated a fascinating Q&A with our first cohort of graduating professional papermakers: Julianne Hunter (Ithaca, NY), Moss Nash (Athens, OH), Mia Pons (Oklahoma City, OK), and Omolará Williams McCallister (Miami) as they shared stories about their work, upcoming projects and learning experiences as well as collaborative edition with visual and performance artist Kelly Taylor Mitchell. A fun cookout followed the touching graduation ceremony.
In The Store
The "Printer’s Choice Line", formerly the Artist Curated Paper Line, has been selected based on feedback from various artists who have experimented and worked with the fine art paper produced by hand at the Morgan Papermaking Conservatory. This line of paper is ideal for editioned works.
Chosen for their versatility and unique characteristics, these crisp sheets offer an unmatched quality and structure that allows each to withstand more stress to the surface than traditional machine-made papers. Explore this special line of paper to see and feel the difference for yourself.
Blog Posts
Our Funders
